This multichamber physical vapour deposition (PVD) sputtering platform is designed to handle silicon wafers and glass panes. The SV-540 is a state-of-the-art machine having dedicated chambers for the sputtering of metallic, dielectric and TCO/TMO layers. The processing chambers are equipped with planar magnetron sources for DC sputtering of metals, oxides and oxynitrides in the reactive mode, and with a cylindrical dual-magnetron source and planar sources for pulsed DC sputtering of dielectrics and TCOs/TMOs, with substrate heating up to 500 degree Celsius….
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