Our most advanced XPS AXIS Supra+ provides a range of applications for surface science analysis. It comes with a heat and cool accessories that allow samples mounted on the sample holder to be heated up to +800°C or cooled to <100°C within the Flexi-lock and/or Sample Analysis Chamber....
Zeiss EVO 10 is a 3-in-1 tool, featuring EBL, FESEM and EDX functions within the same tool. At challenging imaging conditions, the electron emitter users benefit from up to 10 times more beam brightness, resulting in an enhanced image resolution and contract. The SmartEDX, which is designed to acquire spatially resolved elemental information from the sample surfaces, obtains its highest throughput at 129 keV energy resolution at typical SEM operating conditions….
This is an advanced battery research lab, equipped with 2 dry rooms (Relative Humidities 1% and 20%) designed for fabrication of batteries (electrodes and slurry) and a battery testing room, capable of galvanostatic charge-discharge tests up to 100 mA for coin, pouch and cylindrical cells….
The Bruker AFM is able to operate in 2 modes, ICON AFM Scanner and Fast Scan ADM scanner. The fast scan mode provides X-Y tip velocity of >2 mm per sec, hence is able to scan a sample within a short span of 15 mins. There are also various modes to use, such as the nanomechanical mapping, nanomanipulation, surface potential etc….
MJB4 mask aligner is equipped with a reliable, high precision alignment and high resolution printing capability in the submicron range. It offers fast and highly accurate alignment with SUSS singlefield or spitfield microscope….
6 magnetron sputtering sources (3 DC and 3 AC) mainly for deposition of metals and dielectrics. The DC and RF generators support up to 750 W and 300 W respectively with auto-matching unit. Sample holder is able to hold small piece samples, up to full 8 inches in diameter wafer, with rotation and RF/DC biasing capabilities. A heater jacket is provided for chamber bake-out to achieve UHV pressure….
The JEOL JBX-6300FS EBL is a high throughput system, running at 25 keV, 50 keV and 100 keV acceleration voltages. It has mulit cassette loader (up to 10 samples) and is able to process piece part samples and full 4 inches diameter substrates. The minimum linewidth achievable in our cleanroom environment is 12 nm with sticking accuracy of less than +/- 20 nm at 100 keV. It comes with Genisys-Beamer software to assist in high resolution patterning by proximity effects….
The FEI Verios 460 is one of the leading extreme high resolution SEM family. It provides sub-nanometer resolution from 1~30 keV and enhanced contract needed for precise measurements on materials in advanced semiconductor manufacturing and advanced materials science applications. Our system is equipped with various detectors (in-column detector, ICD for high resolution imaging, STEM detector for scanning transmission electron microscopy of thin membrane etc). It also possesses electron back scattered diffraction, EBSD for crystal orientation mapping….
The AJA electron beam evaporator system is equipped with 6x 15cc crucibles for depositing 6 materials within the same load-lock system….
The Alpha 300R offers unique ability to acquire chemical information non-destructively. It allows you to observe and analyse the distribution of different phases within a sample in ambient conditions without the need to specially prepare your samples. In addition to chemical compounds, analysis of physical properties such as crystallinity or materials stress are also possible….
The laser writer tool is designed for definition of planar geometries and for surface diagnostics, in applications where maximum resolutions down to 0.7 um are required. The system transforms a laser beam into a controlled writing tool for photolithographic mask fabrication or for direct in situ processing on planar substrates. This also eliminates the requirement of mask for optical lithography….
The DRIE uses special gases for standard industry semiconductor etching purpose. It is able to etch the samples in 2 modes, Bosch (chiller mode) and the Cryo (liquid nitrogen mode which could go to sub 20°C). Apart from being able to etch silicon substrates, it could be used to etch oxides and nitrides and provide good selectivity. It is also equipped with a load-lock and the processes are automated and user-friendly….
An expert from Centre for Advanced 2D Materials (CA2DM), Ang Han Siong is the person to approach for queries involving in the area of Nano device fabrication and characterisation based on 2D materials…