Description
6 magnetron sputtering sources (3 DC and 3 AC) mainly for deposition of metals and dielectrics. The DC abd RF generators support up to 750 W and 300 W respectively with auto-matching unit. Sample holder is able to hold small piece samples, up to full 8 inches in diameter wafer, with rotation and RF/DC biasing capabilities. A heater jacket is provided for chamber bake-out to achieve UHV pressure.
Technical Specifications
N/A
Model
UHV sputtering
Manufacturer
AJA International, Inc
Application
Thin film deposition (Cu-Ni, Ti, Ag, Cr, Ni, Au, SiO2)
Special Remarks
Cleanroom class 100 and class 1000
Location
Centre for Advanced 2D Materials (CA2DM)
NUS Science S14-01-02
6 Science Drive 2, Singapore 117546
Booking Information
Charges: N/A
Service or Self-operated: Self-operated
Website for booking: https://graphene.nus.edu.sg/our-solutions/tools-usage/
Key Contact(s)
Ang Han Siong
c2dahs@nus.edu.sg
CA2DM | Fabrication | Materials | Equipment