Description
Extra Ultraviolet (EUV) Branch Beamline is a second branch of the main SINS beamline. Its primary purpose is to measure the reflectivity of EUV optical components
Technical Specifications
XPS (X-ray photoelectron spectroscopy)
Angle-resolved photoemission spectroscopy (ARPES)
X-ray absorption spectroscopy (XAS)
X-ray linear dichroism (XLD)
X-ray magnetic circular dichroism (XMCD)
Model
NA
Manufacturer
CXRO (center for X-ray Optics), U.S.A.
Application
• Characterization of EUV multilayers
• New absorbers
• Roughness/Scattering of thin films
• New buffer layers
• Actinic defect inspection
Special Remarks
Potential users contact the beamline scientists to discuss feasibility of their projects/experiments first before booking beamtime slots.
Location
Singapore Synchrotron Light Source
5 Research Link, Singapore 117603
Booking Information
Charges: S$180.00/S$230.00/S$400.00 per hour, depending on the type of service required
Service or Self-operated: Service required
Website for booking: https://ssls.nus.edu.sg/fac-sinseuv.html
Key Contact(s)
Yu Xiaojiang
slsyxj@nus.edu.sg
Characterisation | Analysis | Imaging | Materials | SSLS | Equipment