Description
The laser writer tool is designed for definition of planar geometries and for surface diagnostics, in applications where maximum resolutions down to 0.7 um are required. The system transforms a laser beam into a controlled writing tool for photolithographic mask fabrication or for direct in situ processing on planar substrates. This also eliminates the requirement of mask for optical lithography.
Technical Specifications
N/A
Model
LW405B
Manufacturer
Microtech
Application
Laser lithography (~0.7 um) line width
Special Remarks
Cleanroom class 100 and class 1000
Location
Centre for Advanced 2D Materials (CA2DM)
NUS Science S14-01-04
6 Science Drive 2, Singapore 117546
Booking Information
Charges: N/A
Service or Self-operated: Self-operated
Website for booking: https://graphene.nus.edu.sg/our-solutions/tools-usage/
Key Contact(s)
Ang Han Siong
c2dahs@nus.edu.sg
CA2DM | Fabrication | Materials | Equipment