Scanning Electron Microscope with Lithography

Description
Zeiss EVO 10 is a 3-in-1 tool, featuring EBL, FESEM and EDX functions within the same tool. At challenging imaging conditions, the electron emitter users benefit from up to 10 times more beam brightness, resulting in an enhanced image resolution and contract. The SmartEDX, which is designed to acquire spatially resolved elemental information from the sample surfaces, obtains its highest throughput at 129 keV energy resolution at typical SEM operating conditions.

Technical Specifications
N/A

Model
EVO 10

Manufacturer
Zeiss

Application
• Electron beam Lithography (~1 um)
• FESEM
• EDX (Energy Dispersive X-Ray Spectroscopy)

Special Remarks
Cleanroom class 100 and class 1000

Location
Centre for Advanced 2D Materials (CA2DM)
NUS Science S14-01-01
6 Science Drive 2, Singapore 117546

Booking Information
Charges: N/A
Service or Self-operated: Self-operated
Website for booking: https://graphene.nus.edu.sg/our-solutions/tools-usage/

Key Contact(s)
Ang Han Siong
c2dahs@nus.edu.sg


CA2DM | Fabrication | Materials | Equipment