Plasma Etch System

Description
This system enables the cleaning of surfaces, such as before bonding, soldering or gluing, as well as the activation of surfaces before printing, varnishing or gluing. Gases available are Ar, O2 and N2.

Technical Specifications
Power: 0 to 300 W
Ar: 0 to 20 sccm; O2: 0 to 50 sccm

Model
PICO 300

Manufacturer
Diener Electronic

Application
Lithography tool

Special Remarks
Open to both NUS and external users.
Contact Ngee Hong Teo (mtnh@nus.edu.sg) and Tiho (tiho@nus.edu.sg) to schedule a project meeting.

Location
Materials Science and Engineering, T11 Shared Facilities
Temasek Laboratories @ NUS
Level 11
5A Engineering Drive 1, Singapore 117411

Booking Information
Charges: This is not in public domain yet.
Service or Self-operated: Self-operated
Website for booking: N/A

Key Contact(s)
Jian Linke
linke@nus.edu.sg


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