Description
MPR-6 Plasma Asher used for the removal of photoresist or other non-metallic material on the substrates like silicon wafers using plasma created by exciting ions in a gas, usually oxygen and CF4.
Technical Specifications
Etching materials: photoresist, polyimide and other materials
Electrode size: Φ 250 mm
Maximum sample size: Φ 6 inches, 1 piece
Model
MPR-6
Manufacturer
CSWN
Application
Surface cleaning and etching (patterns or features on substrates for microfabrication in electronics)
Photoresist removal
Surface activation / plasma treatment
Oxide removal
Polymer treatment
Semiconductor fabrication
Others
N/A
Location
Institute for Health Innovation & Technology (iHealthtech)
College of Design and Engineering
E7-05-05
15 Kent Ridge Crescent
Singapore 119276
Booking Information
Charges: $60/h
Service or Self-operated: Self-operated after training/ Service required
Website for booking: N/A
Key Contact(s)
Archana
archana3@nus.edu.sg