Description
A mask aligner for UV lithography.
Technical Specifications
Xe-Hg vapour UV lamp
Standard UV (G-line and I-line, with filters) and DUV (200 nm, with filters)
Can handle small samples and 4″ wafers, with alignment
2 microns resolution
Model
MJB4
Manufacturer
SÜSS MicroTec
Application
UV lithography
Special Remarks
Services produced by the tool are available through our internal staff, not direct access.
Location
Mechanobiology Institute, micro-nano Fabrication Core
Temasek Laboratories @ NUS
Level 5 micro-nano Fabrication Core
5A Engineering Drive 1, Singapore 117411
Booking Information
Charges: N/A
Service or Self-operated: Service required
Website for booking: N/A
Key Contact(s)
Gianluca Grenci
mbigg@nus.edu.sg
Mohammed Ashraf
mbima@nus.edu.sg
Fabrication | Life Science | Materials | MBI | Equipment