Description
The Mask Aligner MJB4 system is a precision photolithography tool used in the fabrication of microelectronic devices. It aligns a photomask with a substrate, typically a silicon wafer, and then exposes the substrate to ultraviolet (UV) light. This process transfers the mask’s pattern onto a light-sensitive photoresist layer on the substrate.
Technical Specifications
Minimum substrate size: 5 x 5 mm2
Mask size: 6”x 6”
Source: DC lamp (405 nm)
Source power: 70 mW
Resolution: 3 um
Model
MJB4
Manufacturer
SÜSS MicroTec
Application
Lithography tool
Special Remarks
Open to both NUS and external users.
Contact Ngee Hong Teo (mtnh@nus.edu.sg) and Tiho (tiho@nus.edu.sg) to schedule a project meeting.
Location
Materials Science and Engineering, T11 Shared Facilities
Temasek Laboratories @ NUS
Level 11
5A Engineering Drive 1, Singapore 117411
Booking Information
Charges: This is not in public domain yet.
Service or Self-operated: Self-operated
Website for booking: N/A
Key Contact(s)
Jian Linke
linke@nus.edu.sg
CDE | Fabrication | Materials | Equipment