Description
MJB4 mask aligner is equipped with a reliable, high precision alignment and high resolution printing capability in the submicron range. It offers fast and highly accurate alignment with SUSS singlefield or spitfield microscope.
Technical Specifications
HR optics prints down to 0.5um, combined SUSS broadband optics (UV250/300/400) allows for fast switching between different wavelengths and wafer and substrate handling up to 100mm
Model
MJB4
Manufacturer
SÜSS Microtech
Application
UV lithography (~1 um)
Special Remarks
Cleanroom class 100 and class 1000
Location
Centre for Advanced 2D Materials (CA2DM)
NUS Science S14-01-04
6 Science Drive 2, Singapore 117546
Booking Information
Charges: N/A
Service or Self-operated: Self-operated
Website for booking: https://graphene.nus.edu.sg/our-solutions/tools-usage/
Key Contact(s)
Ang Han Siong
c2dahs@nus.edu.sg
CA2DM | Fabrication | Materials | Equipment