Magnetron Sputter Coater

Description
Technol Magnetron Sputter coater works on physical vapor deposition (PVD) method of thin film deposition by the phenomenon of sputtering at high speed at low pressure. This involves ejecting material from a “target” that is source onto a “substrate” to form thin film/coatings on the substrate.

Technical Specifications
Chamber structure: Vertical front door structure, rear pumping system
Chamber size: Φ500 × 420 mm (H)
Rotating substrate holder: Φ150 mm
Targets: 1 RF target – non- metal coating, 1 DC target – Au coating, 1 DC target – other metal coating
Coating material: silver, aluminum, copper, nickel, chromium, nickel-chromium alloy, titanium oxide, ITO, silica, etc

Model
JCP500

Manufacturer
Technol

Application
Conductive nanolayers
Conductive films on flexible substrates/ stretchable electronic devices
Electrochromic and smart devices
Preparation of single & multi-layer metal film, dielectric film, semiconductor film, sensor film, heat-resistant alloy film, hard film, corrosion-resistant film, etc.

Others
Minimum booking: 2 hours

Location
Institute for Health Innovation & Technology (iHealthtech)
College of Design and Engineering
E7-05-05
15 Kent Ridge Crescent
Singapore 119276

Booking Information
Charges: $75/h
Service or Self-operated: Self-operated after training/ Service required
Website for booking: N/A

Key Contact(s)
Archana
archana3@nus.edu.sg

Biomedical Science | Fabrication | iHealthtech | Equipment