Description
This system applies an external magnetic field during the annealing process, which serves as an effective process to enhance the performance of magnetic devices and materials.
Technical Specifications
Magnetic field: Up to 8 Tesla
Wafer size: 2” (51 mm) circular Ø and 5 product wafers
Wafer orientation: In plane or perpendicular to magnetic field direction
Temperature range: 200°C to 450°C
Model
MATr8000
Manufacturer
TEL
Application
Annealing with applied magnetic field
Special Remarks
Training is required – https://cde.nus.edu.sg/e6nanofab/what-we-offer/
Already open to External = NTU, SUTD and other higher learning institutions, A*STAR and DSO.
Location
E6NanoFab
College of Design and Engineering
Level 1 Class 100 Cleanroom
5 Engineering Drive 1, Singapore 117608
Booking Information
Charges: https://cde.nus.edu.sg/e6nanofab/wp-content/uploads/2023/05/20230501_Web-Published-Price-List.pdf
Service or Self-operated: Service required/Self-operated
Website for booking: https://cde.nus.edu.sg/e6nanofab/magnetic-annealing-system-2/
Key Contact(s)
Loh Fong Leong
e6nanofab@nus.edu.sg
CDE | Fabrication | Materials | Equipment