Description
Heidelberg DWL 66+ laserwriter is a high resolution pattern generator for direct writing and mask making.
Technical Specifications
Maximum substrate size: 9” x 9”
Minimum substrate size: 10 x 10 mm²
Maximum write area: 200 x 200 mm²
Substrate thickness: 0 to 6 mm
Illumination source: Diode laser (405 nm) for standard positive resist exposure
Direct writing with minimum feature size of 0.6 μm
High accuracy overlay alignment of 400 nm
Vector exposure mode offers five different line widths
Model
DWL 66+
Manufacturer
Heidelberg Instruments
Application
Lithography tool
Special Remarks
Training is required – https://cde.nus.edu.sg/e6nanofab/what-we-offer/
Already open to External = NTU, SUTD and other higher learning institutions, A*STAR and DSO.
Location
E6NanoFab
College of Design and Engineering
Level 1 Class 10 Cleanroom
5 Engineering Drive 1, Singapore 117608
Booking Information
Charges: https://cde.nus.edu.sg/e6nanofab/wp-content/uploads/2023/05/20230501_Web-Published-Price-List.pdf
Service or Self-operated: Self-operated
Website for booking: https://cde.nus.edu.sg/e6nanofab/laser-writer-class-10/
Key Contact(s)
Xiao Yun
e6nanofab@nus.edu.sg
CDE | Fabrication | Materials | Equipment