Description
This inline sputtering tool from FHR Anlagenbau, Germany has three planar magnetron sources, whereby two sources are connected to a DC power supply for DC sputtering of metal layers, while the third source is connected to an RF power supply for the deposition of dielectric films.
Technical Specifications
Available materials: ITO, NiO, Al, In
Max. substrate size: 30 cm x 40 cm
Substrate temperature: Room temperature
Model
FHR Line 540
Manufacturer
FHR Anlagenbau GmbH, Germany
Application
Thin film deposition by magnetron sputtering
Special Remarks
Booking system available for SERIS internal staff only.
Location
Solar Energy Research Institute of Singapore
College of Design and Engineering
E3A-02B
7 Engineering Drive 1
Singapore 117574
Booking Information
Charges: N/A
Service or Self-operated: Service required
Website for booking: N/A
Key Contact(s)
Selvaraj Venkataraj
serselva@nus.edu.sg
Fabrication | Materials | SERIS | Equipment