ICP Etch Cluster with 3 Modules / Plasma

Description
The 3-chamber-modules advanced dry etching cluster system is used for micro- and nanomachining of various materials, with 8” wafer size, 300 mm diameter alumina discharge chamber, up to 8 mass flow controlled gas lines for each module and a minimum base pressure of 1×10-6 torr.

Technical Specifications
Metal etch module
• Coolant-cooled/electrically heated etch lower electrode, working temperature: -20°C ± 80°C
• Standard gas line and MFC for nontoxic gases (SF6, Ar, O2, N2)
• Bypassed gas line and MFC for toxic gas (Cl2, BCl3, HBr, CH4)
• External gas pod gas line heating kit for low vapour pressure gases (BCl3)

Dielectric etch module
• Coolant-cooled/electrically heated etch lower electrode, working temperature: -20°C ± 80°C
• Standard gas line and MFC for nontoxic gases (SF6, Ar, O2, N2, C4F8, CHF3)
• Bypassed gas line and MFC for toxic gas (Cl2)

III-V compound etch module
• Cryo-cooled/electrically heated etch lower electrode, working temperature: -150°C ± 400°C
• Rapid cooling from cryo to chiller mode, from 200°C to 20°C in 40 minutes
• Standard gas line and MFC for nontoxic gases (SF6, Ar, O2, N2)
• Bypassed gas line and MFC for toxic gas (Cl2, BCl3, H2, CH4)
• External gas pod gas line heating kit for low vapour pressure gases (BCl3)

Model
PlasmaPro 100 Cobra 300 Cluster

Manufacturer
Oxford Instruments

Application
Pattern creation and surface treatment in micro-nano device fabrication

Special Remarks
Training is required – https://cde.nus.edu.sg/e6nanofab/what-we-offer/
Already open to External = NTU, SUTD and other higher learning institutions, A*STAR and DSO.

Location
E6NanoFab
College of Design and Engineering
Level 5 Class 1000 Cleanroom
5 Engineering Drive 1, Singapore 117608

Booking Information
Charges: https://cde.nus.edu.sg/e6nanofab/wp-content/uploads/2023/05/20230501_Web-Published-Price-List.pdf
Service or Self-operated: Self-operated
Website for booking: https://cde.nus.edu.sg/e6nanofab/integrated-icp-etch-clustering-system/

Key Contact(s)
Thomas Ang
e6nanofab@nus.edu.sg


CDE | Fabrication | Materials | Equipment