Description
The FESEM system is used to capture the microstructure image of materials.
Technical Specifications
Accelerating voltage: 0.5 to 30 kV
Resolution: 0.7 nm at 15 kV (SE), 0.9 nm at 1 kV w/ deceleration (SE)
Magnification range: 20X to 2000X (low magnification), 100X to 2,000,000X (high magnification)
Detectors: Lower/ Upper/ Top, YAG BSE, STEM (Bright-Field/ PD-Dark Field), EDX
Stage traverse: (5-axis Motorized) X: 0 to 110 mm, Y: 0 to 11 mm, Z: 1.5 to 40 mm R: 360°, T: -5° to +70°
Observable range: 150 mm diameter (Max sample size)
Specimen exchange chamber size: 6 inch diameter
Model
Regulus 8230
Manufacturer
Hitachi High-Tech Corporation
Application
Field emission scanning electron microscope
Special Remarks
Training is required – https://cde.nus.edu.sg/e6nanofab/what-we-offer/
Already open to External = NTU, SUTD and other higher learning institutions, A*STAR and DSO.
Location
E6NanoFab
College of Design and Engineering
Level 3 Metrology
5 Engineering Drive 1, Singapore 117608
Booking Information
Charges: https://cde.nus.edu.sg/e6nanofab/wp-content/uploads/2023/05/20230501_Web-Published-Price-List.pdf
Service or Self-operated: Self-operated
Website for booking: https://cde.nus.edu.sg/e6nanofab/fib-sem-ultra-high-resolution/
Key Contact(s)
Linn Linn
elelinnl@nus.edu.sg
CDE | Characterisation | Analysis | Imaging | Materials | Equipment