Description
The FEI Helios 450S FIB is a dual beam Ga+ ion & electron microscope with high-resolution topographical imaging and patterning capabilities. The electron beam is primarily used for surface characterization, while the ion beam is used for top-down fabrication tasks such as TEM lamella preparation, cross-section failure analysis, and nanoscale surface modification. The stability of the low voltage ion beam and chamber cleaning attachments reduces contamination and amorphization vital for S/TEM analysis.
Technical Specifications
Field-emission electron gun
LMIS: Ga ion beam (0.2 to 30 kV) / Tomahawk ion column
Spatial resolution: 0.9 nm (SEM), 4.5 nm (FIB)
ETD SE detector
STEM detector
Pt & C gas injection systems
OmniProbe manipulator
Plasma cleaner / cold trap
Model
Helios 450S Dual Beam
Manufacturer
FEI
Application
• SEM imaging
• Cross-sectioning, patterning
• TEM lamella preparation
Special Remarks
Training is required – https://cde.nus.edu.sg/emf/facilities/
Location
Electron Microscopy Facility
College of Design and Engineering
E4-02-05
4 Engineering Drive 3
Singapore 117583
Booking Information
Charges: https://cde.nus.edu.sg/emf/facilities/
Service or Self-operated: Self-operated
Website for booking: https://cde.nus.edu.sg/emf
Key Contact(s)
Chung Jing Yang
jy.chung@nus.edu.sg
Zhou Xin
xin_zhou@nus.edu.sg
CDE | Fabrication | Imaging | Materials | Equipment