Description
Furnace system for wet and dry oxidation in the temperature range of 200 to 1000 degree Celsius
Technical Specifications
Deposition: SiO2
Substrate Size: 8 inch wafer only
Product yield: 40 wafer/ run max
Heater temp: 200 to 1000°C
Heater zone: 1 to 3 zone
Process uniformity
• Refractive Index: 1.46 ≤±0.01@1000 nm (WIW, WTW, RTR) (edge exclusion is 10 mm)
• Wet oxidation: 1000 nm ≤ ± 1% (WIW, WTW, RTR)
Model
Pyro-H200
Manufacturer
Ultech
Application
Oxidation
Special Remarks
Training is required – https://cde.nus.edu.sg/e6nanofab/what-we-offer/
Already open to External = NTU, SUTD and other higher learning institutions, A*STAR and DSO.
Location
E6NanoFab
College of Design and Engineering
Level 1 Class 100 Cleanroom
5 Engineering Drive 1, Singapore 117608
Booking Information
Charges: https://cde.nus.edu.sg/e6nanofab/wp-content/uploads/2023/05/20230501_Web-Published-Price-List.pdf
Service or Self-operated: Self-operated
Website for booking: https://cde.nus.edu.sg/e6nanofab/furnance/
Key Contact(s)
Patrick Tang
patrick@nus.edu.sg
CDE | Fabrication | Materials | Equipment