Description
The SCIA Coat 200 is designed for homogeneous coating of high precision optics such as X-ray mirrors and optical filters with the technology of Dual Ion Beam Deposition (DIBD). The system is also equipped with a RF350-e ion beam source for etching process.
Technical Specifications
Cylindrical ICP ion beam source RF350-e
Beam diameter of 350 mm at extraction grid
Inductively coupled plasma (ICP) based plasma excitation with RF generator at 4.00 MHz
Ion energy: < 100 eV Max. ion energy: > 1500 eV
Ion current density up to 1 mA/cm² with flat grid system
Wafer chuck for 200 mm wafers
Substrate rotation up to 20 rpm
Substrate holder tilt between 0° to 170° in 0.1° steps
A standard 4-port handling robot for fully automatic handling of wafers
Load-lock for loading of three 200 mm wafers
HAL IMP 301/3F Ion Milling End Point Detection System
With Secondary Ion Mass Spectroscopy (SIMS), an in-situ measurement of sputtered material from substrate can be done.
The system is controlled by Windows 7 with fully SEMI-standard compatible software suite.
Etch rate: > 8 nm/min, uniformity: ≤ 8 % 3σ, reproducibility (10 runs) ≤ 3 % 3σ
Deposition rate (Ta) > 6 nm/min, uniformity: ≤ 3 % 3σ , reproducibility (10 runs) ≤ 2 % 3σ
Model
Coat 200
Manufacturer
Scia Systems
Application
Ion beam etcher and materials deposition such as SiNx, SiO2, Ta2O5
Special Remarks
Training is required – https://cde.nus.edu.sg/e6nanofab/what-we-offer/
Already open to External = NTU, SUTD and other higher learning institutions, A*STAR and DSO.
Location
E6NanoFab
College of Design and Engineering
Level 1 Class 100 Cleanroom
5 Engineering Drive 1, Singapore 117608
Booking Information
Charges: https://cde.nus.edu.sg/e6nanofab/wp-content/uploads/2023/05/20230501_Web-Published-Price-List.pdf
Service or Self-operated: Self-operated
Website for booking: https://cde.nus.edu.sg/e6nanofab/scia-coat-200-ion-beam-deposition-and-etching/
Key Contact(s)
David Xu Baochang
e6nanofab@nus.edu.sg
CDE | Fabrication | Materials | Equipment