Description
The JEOL JBX-6300FS EBL is a high throughput system, running at 25 keV, 50 keV and 100 keV acceleration voltages. It has mulit cassette loader (up to 10 samples) and is able to process piece part samples and full 4 inches diameter substrates. The minimum linewidth achievable in our cleanroom environment is 12 nm with sticking accuracy of less than +/- 20 nm at 100 keV. It comes with Genisys-Beamer software to assist in high resolution patterning by proximity effects.
Technical Specifications
High speed writing mode:
• Beam current 400 pA to 5 nA
• Minimum line width: 50 nm to 100 nm
• White field: 500 um
High resolution writing mode:
• Beam current 100 pA
• Minimum line width: 10 nm
• White field: 62.5 um
Model
JBX-6300FS
Manufacturer
JEOL Ltd.
Application
Electron beam lithography (~12 nm)
Special Remarks
Cleanroom class 100 and class 1000
Location
Centre for Advanced 2D Materials (CA2DM)
NUS Science S14-01-03A
6 Science Drive 2, Singapore 117546
Booking Information
Charges: N/A
Service or Self-operated: Self-operated
Website for booking: https://graphene.nus.edu.sg/our-solutions/tools-usage/
Key Contact(s)
Ang Han Siong
c2dahs@nus.edu.sg
CA2DM | Fabrication | Materials | Equipment