Description
The Ion Slicer can prepare thin-film specimens without solvents or chemicals and requires no prior treatment of the specimen other than rectangular slicing (no disc grinding or dimple grinding)
Technical Specifications
Ion accelerating voltage : 1 to 8 kV
Tilt angle: Up to 6° (0.1°step)
Beam diameter: 500 μm (FWHM)
Milling rate: 5m/min (8 kV, silicon)
Gas for beam irradiation: Argon
Recommended specimen size: 2.8 mm (in length) 0.5 mm (in width) 0.1 mm (in thickness)
Model
EM-09100 IS
Manufacturer
JEOL Ltd.
Application
Sample preparation
Special Remarks
Contact Yang Fengzhen
mseyf@nus.edu.sg for more details on booking.
Location
Electron Microscopy Facility
College of Design and Engineering
E4-02-04
4 Engineering Drive 3
Singapore 117583
Booking Information
Charges: N/A
Service or Self-operated: Self-operated
Website for booking: N/A
Key Contact(s)
Yang Fengzhen
mseyf@nus.edu.sg
CDE | Fabrication | Imaging | Materials | Equipment