Description
Fully programmable and user-friendly, the Cee® 200X features the accuracy and repeatability needed to eliminate processing variability from photoresist and thin film deposition processes.
Technical Specifications
Minimum substrate size: 3 x 3 mm2
Maximum substrate size: 8” x 8”
Maximum speed: 6000 RPM
Available resists: AZ5214E, AZ9264 & SU-8 resist
Model
Cee® 200X
Manufacturer
Cee®
Application
Spin coater apply thin and uniform layers of materials onto substrates through high speed and dispensing the coating material
Special Remarks
Open to both NUS and external users.
Contact Ngee Hong Teo (mtnh@nus.edu.sg) and Tiho (tiho@nus.edu.sg) to schedule a project meeting.
Location
Materials Science and Engineering, T11 Shared Facilities
Temasek Laboratories @ NUS
Level 11
5A Engineering Drive 1, Singapore 117411
Booking Information
Charges: This is not in public domain yet.
Service or Self-operated: Self-operated
Website for booking: N/A
Key Contact(s)
Jian Linke
linke@nus.edu.sg
CDE | Chemistry | Materials | Fabrication | Equipment