Description
Heidelberg laser writer is a high resolution pattern generator for direct writing and mask making.
Technical Specifications
Maximum substrate size: 9” x 9”
Minimum substrate size: 10 x 10 mm²
Maximum write area: 200 x 200 mm²
Substrate thickness: 0 to 6 mm
Illumination source: Diode laser (405 nm) for standard positive resist exposure
Direct writing with minimum feature size of 0.6 μm
High accuracy overlay alignment of 400 nm
Vector exposure mode offers five different line widths
Model
MLA 150
Manufacturer
Heidelberg Instruments
Application
Lithography tool
Special Remarks
Open to both NUS and external users.
Contact Ngee Hong Teo (mtnh@nus.edu.sg) and Tiho (tiho@nus.edu.sg) to schedule a project meeting.
Location
Materials Science and Engineering, T11 Shared Facilities
Temasek Laboratories @ NUS
Level 11
5A Engineering Drive 1, Singapore 117411
Booking Information
Charges: This is not in public domain yet.
Service or Self-operated: Service required
Website for booking: N/A
Key Contact(s)
Jian Linke
linke@nus.edu.sg
CDE | Fabrication | Materials | Equipment