Description
The Versa 3D DualBeam FEG FIB-SEM combines a focused Ga ion beam with a high-resolution field-emission electron gun. Owing to a large chamber allowing up to 6″ industry wafers with full rotation, the Versa 3D provides enhanced 2D and 3D materials characterization and analysis for a wide range of material science and industry-related samples.
Technical Specifications
Field-emission electron gun
LMIS: Ga ion beam (0.5 to 30 kV) / Sidewinder ion column
Spatial Resolution: 1.2 nm (SEM)
ETD SE detector
Pt & C gas injection systems
EasyLift manipulator
150 mm maximum sample size
Model
Versa 3D Dual Beam
Manufacturer
FEI
Application
• SEM imaging
• Cross-sectioning, patterning
• TEM lamella preparation
Special Remarks
Training is required – https://cde.nus.edu.sg/emf/facilities/
Location
Electron Microscopy Facility
College of Design and Engineering
E4-02-05
4 Engineering Drive 3
Singapore 117583
Booking Information
Charges: https://cde.nus.edu.sg/emf/facilities/
Service or Self-operated: Self-operated
Website for booking: https://cde.nus.edu.sg/emf
Key Contact(s)
Chung Jing Yang
jy.chung@nus.edu.sg
Zhou Xin
xin_zhou@nus.edu.sg
CDE | Fabrication | Imaging | Materials | Equipment